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Posted By: Vidya       Member Level: Diamond       Posted Date: 09 Jul 2008

2007 Anna University B.Tech Linear and digital integrated circuit Question paper



Course: B.Tech   University: Anna University




Anna University
Linear and digital integrated circuit

B.E /B.TECH.DEGREE EXAMINATION ,MAY/JUNE 2007
Fifth semester

Time: 3 Hrs
Maximum:100 marks

PART A (10 X2 =20)


1. What is the priciple of photo lithography?

2. List any two important features of ion implantation process

3. What are precision rectifier?

4.Draw the circuit of an OPAMP comparator

5.What are the features of CMOS transmission gate?

6. Draw the structure of 1 bit DRAM cell

7.List the four major IC technologies used today.

8.State moore's law

9.What are sampling converters?

10. Write a typical application for AD 590

PART B (5X16 =80)

11. (a) (i) Discuss the steps involved in the process of IC fabrication

(ii) With schematic explain the different fabrication method for realizing diode from a transistor

OR

(b) (i) Briefly explain the electron beam lithographic technique and compare with other types


(ii) What is the effect of oxidizing ambient and lateral enhancement of diffusivity of diffusion process?

12 (a) Explain the following application of operational amplifier

(i)555 Timer as monostable mutvibrator

(ii)) Sine wave generator

OR

(b) (i) With circuit,explain the LM 723 voltage rgulator circuit strucutr and mention its important fetures

(ii)Explain the application of PLL as frequency synthesizer and AM detector

13(a) (i) What is the influence of fan in and fan out on the propagation delay of CMOS gate

(ii) Explain any one fast multiplier

OR

(b) (i) What are the draw backs of ripple carry adder? Discuss ant two Adder structures to over come these draw backs.

(ii) Draw the block schematic of hierarchical memory of architecture and explain its features

14(a) (i) Compare CMOS ,BJT technologies

(ii) Explain the basic assembly operations involved in plastic or ceramic packaging

OR

(b) (i) Discuss the effect of defects on the yield of an IC

(ii) Describe the fabrication process for bipolar ICs and explain hte factors that are to be addressed


15 (a) (i) Explain the fuctional diagrams of XR 2206 and discuss how FSK generation is implemented using the same

(ii) Draw the circuit of a first order sigma- delta ADC and explain its operations

OR

(b) (i) What is the need for noise -shaping in over sampled converters?Explain the method

(ii) Explain the characteristics of AD 590 with necessary diagram.





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